Moore’s Law and the Physics of Manufacturing Nanoscale Devices
Over 50 years ago, Gordon Moore postulated that the number of devices in an integrated circuit would double roughly every 1.5-2 years. Lithography is the technology used to keep this up for the last 50 years. Lithography has gone through several iterations, and is currently going through a paradigm shift from deep ultraviolet with a wavelength of 193 nm, to extreme ultraviolet (EUV) with a wavelength of 13.5 nm. The transition to such a short wavelength has presented many scientific and technological challenges. I'll discuss the history of semiconductor lithography and how potential "showstoppers" in the EUV have been overcome.
Hosted by Howard Milchberg